Yazar "Steigmeier, David" seçeneğine göre listele
Listeleniyor 1 - 1 / 1
Sayfa Başına Sonuç
Sıralama seçenekleri
Öğe Fabrication Trueness, Intaglio Surface Adaptation, and Marginal Integrity of Resin- Based Onlay Restorations Fabricated by Additive and Subtractive Manufacturing(Quintessence Publishing Co Inc, 2024) Cakmak, Gulce; Steigmeier, David; Guven, Mehmet Esad; Yilmaz, Deniz; Schimmel, Martin; Yoon, Hyung-In; Yilmaz, BurakPurpose: To evaluate the fabrication trueness, intaglio surface adaptation, and marginal integrity of resin- based onlay restorations made via additive manufacturing (AM) or subtractive manufacturing (SM). Materials and Methods: An onlay restoration was designed (DentalCAD Galway 3.0) and saved as an STL file to generate a design STL file (DO-STL). Using this design, 45 onlays were fabricated either with AM (3D-printed resin for definitive [AM-D; Tera Harz TC- 80DP] and interim [AM- I; Freeprint temp] restorations) or SM (composite resin, Tetric CAD) technologies. Onlays were scanned with an intraoral scanner (CEREC Primescan SW 5.2), and the scans were saved as test STL files (TO-STLs). For trueness evaluation, TO-STLs were superimposed over the DO-STL, and root mean square (RMS) values of overall and intaglio surfaces were measured (Geomagic Control X). For the intaglio surface adaptation and marginal integrity, a triple-scan protocol was performed. Kolmogorov-Smirnov, one- way ANOVA, and post-hoc Tukey honestly significant difference tests were used to analyze data (alpha =.05). Results: RMS values of intaglio and overall surfaces, intaglio adaptation, and marginal integrity varied among test groups (P <.001). AM- D had the greatest overall surface RMS (P <.001), while SM had the greatest intaglio surface RMS (P <.001). SM had the highest average distance deviations for intaglio surface adaptation and marginal integrity, whereas AM-D had the lowest (P <.001). Conclusions: AM-D onlays showed lower overall trueness than AM-I onlays and SM definitive onlays. However, AM-D onlays presented high intaglio surface trueness, intaglio surface adaptation, and marginal integrity.












