Sogut, OmerCengiz, ErhanAyaz, Durdu HayrettinApaydin, Gokhan2026-01-242026-01-2420230969-80431872-9800https://doi.org/10.1016/j.apradiso.2023.110957https://hdl.handle.net/20.500.12868/5640K & beta;/K & alpha; X-ray intensity ratio values of Cu and Ag in CuxAg1-x (x = 53.5, 67.6, 76.9, 85.4, 89.6) thin alloy films produced from two different sources by the physical vapour deposition method have been determined by the Energy Dispersive X-ray Fluorescence Spectroscopy (EDXRF) method. The changes in the crystal structures of CuxAg1-x thin alloy films caused by the changes in the Cu and Ag concentrations, which affect the valence electronic structure have been investigated by the X-ray Diffraction (XRD) techniques. The obtained values were compared with the theoretical and fitted values for pure Cu and Ag elements.eninfo:eu-repo/semantics/closedAccessK X-ray intensity ratiosCu -Ag thin alloy filmValance electronic structure(241) Am sourceArticle10.1016/j.apradiso.2023.110957200374948522-s2.0-85165526980Q2WOS:001048324500001Q2